Horak, R. (2021, May), Double-sided Silicon Wafer Surface Protection Method for Photolithography Process  Paper presented at 2020 Northeast Section Meeting, Online. 10.18260/1-2-60-36258

\bibitem{asee_peer_36258}
  Horak, R. (2021, May), \emph{Double-sided Silicon Wafer Surface Protection Method for Photolithography Process}
  Paper presented at 2020 Northeast Section Meeting, Online.
  10.18260/1-2-60-36258

Rebecca Horak.  "Double-sided Silicon Wafer Surface Protection Method for Photolithography Process".  2020 Northeast Section Meeting, Online, 2021, May.  ASEE Conferences, 2021.  https://peer.asee.org/36258 Internet.  18 May, 2024

\bibitem{asee_peer_36258}
  Rebecca Horak.
  "Double-sided Silicon Wafer Surface Protection Method for Photolithography Process".
  \emph{2020 Northeast Section Meeting, Online, 2021, May}.
  ASEE Conferences, 2021.
  https://peer.asee.org/36258 Internet.  18 May, 2024

@INPROCEEDINGS{asee_peer_36258
author = "Rebecca Horak"
title = "Double-sided Silicon Wafer Surface Protection Method for Photolithography Process"
booktitle = "2020 Northeast Section Meeting"
year = "2021"
month = "May"
address = "Online"
publisher = "ASEE Conferences"
note = {https://peer.asee.org/36258}
number = {10.18260/1-2-60-36258}
}

TY  - CPAPER
AU  - Rebecca Horak
CY  - Online
DA  - 2021/05/18
PB  - ASEE Conferences
TI  - Double-sided Silicon Wafer Surface Protection Method for Photolithography Process
UR  - https://peer.asee.org/36258
DO  - 10.18260/1-2-60-36258
ER  -