Topasna, D. (2025, June), BOARD #149: Nanoimprint lithography – a nanotechnology demonstration lab for STEM undergraduate instruction    Paper presented at 2025 ASEE Annual Conference & Exposition , Montreal, Quebec, Canada . https://peer.asee.org/55968

\bibitem{asee_peer_55968}
  Topasna, D. (2025, June), \emph{BOARD \#149: Nanoimprint lithography – a nanotechnology demonstration lab for STEM undergraduate instruction  }
  Paper presented at 2025 ASEE Annual Conference \& Exposition , Montreal, Quebec, Canada .
  https://peer.asee.org/55968

Daniela Topasna.  "BOARD #149: Nanoimprint lithography – a nanotechnology demonstration lab for STEM undergraduate instruction  ".  2025 ASEE Annual Conference & Exposition , Montreal, Quebec, Canada , 2025, June.  ASEE Conferences, 2025.  https://peer.asee.org/55968 Internet.  19 Aug, 2025

\bibitem{asee_peer_55968}
  Daniela Topasna.
  "BOARD \#149: Nanoimprint lithography – a nanotechnology demonstration lab for STEM undergraduate instruction  ".
  \emph{2025 ASEE Annual Conference \& Exposition , Montreal, Quebec, Canada , 2025, June}.
  ASEE Conferences, 2025.
  https://peer.asee.org/55968 Internet.  19 Aug, 2025

@INPROCEEDINGS{asee_peer_55968
author = "Daniela Topasna"
title = "BOARD \#149: Nanoimprint lithography – a nanotechnology demonstration lab for STEM undergraduate instruction  "
booktitle = "2025 ASEE Annual Conference \& Exposition "
year = "2025"
month = "June"
address = "Montreal, Quebec, Canada "
publisher = "ASEE Conferences"
note = {https://peer.asee.org/55968}
}

TY  - CPAPER
AB  - The CHIPS and Science Act introduced in 2022 aims to enhance all aspects of semiconductor industry, including related efforts in STEM education and work force training. We present our project in support of this broad goal. The project aims to introduce to and instruct students on an alternate method of micro/nano fabrication – nanoimprint lithography (NIL). The topic is part of the Introduction to Nanotechnology course that is offered at Virginia Military Institute, a public senior military college. The nanotechnology course is offered by the author in the Department of Physics and Astronomy; it is a three credit hours technical elective, with a significant portion dedicated to theory of semiconductors and micro/nano fabrication and characterization.  In addition to the instruction on theoretical concepts, the course includes several related demos and activities, which allow students to get hands on experience in the thin films lab. The NIL module includes introduction of NIL fabrication technique; safety and lab rules; instruction on the NIL desktop equipment; selection of a template; making the sample; characterization of samples by optical microscopy and scanning electron microscopy); lab report; literature search exercise; classroom presentation. In addition, students learn about career opportunities related to nanoimprint lithography and semiconductor industry. The course activities are well aligned with the ABET general criteria for engineering that include requirements for both basic science and broad education components, instruction on modern equipment, and development of leadership, and written and oral communication skills.  
AU  - Daniela Topasna
CY  - Montreal, Quebec, Canada 
DA  - 2025/06/22
PB  - ASEE Conferences
TI  - BOARD #149: Nanoimprint lithography – a nanotechnology demonstration lab for STEM undergraduate instruction  
UR  - https://peer.asee.org/55968
ER  -